MO-CVDによる高耐食性酸化物多層薄膜の形成

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タイトル別名
  • Corrosion Resistant Multiple Layer Thin Oxide Films Prepared by Metalorganic Chemical Vapor Deposition
  • MO CVD ニ ヨル コウ タイショクセイ サンカブツ タソウ ハクマク ノ

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抄録

Single, duplex and quadruple layer films having the thickness between 20-300 nm of Al2O3, Cr2O3, TiO2 and their combinations were prepared on an Fe substrate by metalorganic chemical vapor deposition technique. Corrosion protection properties of these films were examined in 3 mass%NaCl, 1 kmol·m−3 H2SO4 and 1 kmol·m−3 NaOH by the measurement of electrochemical activation time. In the case of single layer films, the order of protection ability was Cr2O3>Al2O3>TiO2. The adhesiveness of Cr2O3, however, became poorer with increasing film thickness. Al2O3 films showed good adhesiveness at any film thickness examined. For duplex layer films, the order was Cr2O3 (upper)/Al2O3 (lower)>TiO2 (upper)/Al2O3 (lower)>Al2O3 (upper)/TiO2 (lower). The thickness of 40-50 nm of Cr2O3 layer was necessary to get higher corrosion resistance in the structure Cr2O3 (upper)/Al2O3 (lower). Much higher corrosion resistance was given by quadruple layer films of Cr2O3 (uppermost)/Al2O3/Cr2O3/Al2O3 (lowermost) . The uppermost layer of these films was also needed to be 40-50 nm thickness to get the best resistance. The corrosion resistance of the quadruple films was higher than that of passive films on SUS304 and SUS430 stainless steels.

収録刊行物

  • 日本金属学会誌

    日本金属学会誌 51 (11), 1054-1059, 1987

    公益社団法人 日本金属学会

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