けい光X線分析法によるフェロシリコン中のケイ素の定量

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タイトル別名
  • Determination of Silicon in Ferrosilicon with Fluorescent X-ray Spectrometry
  • ケイコウ Xセン ブンセキホウ ニヨル フェロ シリコンチュウ ノ ケイソ ノ

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抄録

X-ray fluorescence analysis was applied to the determination of Si (content:70∼80%) in ferrosilicon and was established as an useful method with good accuracy. The results obtained are summarized as follows :<BR>(1) The technique of briquetting after grinding ferrosilicon with a styrene-maleic acid copolymer (PSM) in an organic solvent is suitable to the preparation of samples for the analysis. After 3g of the ferrosilicon sample is ground with 1g of PSM in 15 ml of n-hexane, a briquet sample is prepared by pressing. (2) Repeatability by this sample preparation is 0.091% as standard deviation or 0.12% as coefficients of variation for 77.30% of Si in ferrosilicon. (3) Calibration curve is shown in a first order revolving formula of Si (%) =0.0230×I+46.697 (I : intensity of SiKα X-ray). (4) In this analysis, the particle size gives a remarkable influence, so that it is important for the ferrosilicon sample to be extracted under a condition as definite as possible and arranged to have uniform particle size. (5) This sample preparation procedure can also be used effectively as an analytical technique for process control.

収録刊行物

  • 日本金属学会誌

    日本金属学会誌 43 (4), 304-308, 1979

    公益社団法人 日本金属学会

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