X-Ray Elemental Imaging in Depth by Combination of FE-SEM-EDS and Glow Discharge Sputtering
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- Onoue Fumiya
- Graduate School of Engineering, Osaka City University
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- Tsuji Kouichi
- Graduate School of Engineering, Osaka City University
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説明
SEM-EDS is a powerful tool for fast, nondestructive x-ray elemental analysis of a localized region. Elemental mapping is also possible by scanning the electron beam. Since the penetration depth of the electron beam is about a few μm, SEM-EDS is useful for determining elemental composition near the surface of the sample. To obtain information regarding the depth of the sample, the surface layer must be removed. For this purpose, we attempted to use glow discharge sputtering. A commercially available rf glow discharge sputtering device (Horiba, Tensec) enables fast sputtering in an area 4 mm in diameter. The combination of SEM-EDS and glow discharge sputtering would be useful for observation of the distribution of inclusions buried in metal samples. Al2O3 particles were mixed with Cu powders, and then pressed into a disk, which was measured. The same area of the sample was analyzed by FE-SEM-EDS and sputtered. The result indicated the possibility of 3D distribution analysis of inclusions in the sample.
収録刊行物
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- ISIJ International
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ISIJ International 53 (11), 1939-1942, 2013
一般社団法人 日本鉄鋼協会
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詳細情報 詳細情報について
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- CRID
- 1390282681463795072
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- NII論文ID
- 130003383824
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- COI
- 1:CAS:528:DC%2BC3sXhvV2it7vM
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- ISSN
- 13475460
- 09151559
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
- OpenAIRE
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- 抄録ライセンスフラグ
- 使用不可