Fabrication and Plasma Treatment of Carbon Nanotubes on Sputtered Cobalt for Electrodes of Electrochemical Capacitors
-
- LIN Chuen-Chang
- Department of Chemical & Materials Engineering, National Yunlin University of Science and Technology
-
- LIAO Jing-Yuan
- Department of Chemical & Materials Engineering, National Yunlin University of Science and Technology
Search this article
Abstract
A cobalt (catalyst) is sputtered at different time levels on graphite foil on which carbon nanotubes are subsequently directly grown by chemical vapor deposition (CVD). Next, carbon nanotubes are modified by RF (radio frequency) oxygen-plasma at different volume flow rates of oxygen and then immersed in nitric acid solution. The longer Co sputtering time led to the thicker Co film thickness. Higher specific capacitance of 140.2 F g−1 is obtained under a certain condition (Co sputtering time=15 min and flow rate of oxygen=30 cm3 min−1). This shows good specific capacitance. Furthermore, the higher flow rate of oxygen caused the higher carbonyl functional group (C=O), thus leading to higher specific capacitance.
Journal
-
- Electrochemistry
-
Electrochemistry 79 (1), 10-14, 2011
The Electrochemical Society of Japan
- Tweet
Details 詳細情報について
-
- CRID
- 1390282681473703168
-
- NII Article ID
- 10027128247
-
- NII Book ID
- AN00151637
-
- COI
- 1:CAS:528:DC%2BC3MXjtVyhtw%3D%3D
-
- ISSN
- 21862451
- 13443542
-
- NDL BIB ID
- 10927118
-
- Text Lang
- en
-
- Data Source
-
- JaLC
- NDL
- Crossref
- CiNii Articles
-
- Abstract License Flag
- Allowed