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- Doi Hiroshi
- Central Research Laboratory, Hitachi Ltd.
Bibliographic Information
- Other Title
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- 二次イオン質量分析計の試作および性能評価
- AES IMA フクゴウガタ コタイ ヒョウメン ブンセキ ソウチ ノ カイハ
- Development of the AES-IMA Device and its Application to Solid Surfaces(1)
- AES-IMA複合型固体表面分析装置の開発と応用研究(第1報)
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Abstract
A combination system of SEM, AES and IMA are developed in one apparatus as a AES-IMA development(AID). A secondary ion mass spectrometer(SIMS)in the AID is a new type analyzer which is composed of an ion extractor system, a new stigmaticsecond order double focusing mass spectrometer and an electric spherical sector. Methods to increase the transmission of secondary ions, to reduce the background noise of the SIMS and to make the resolving power of the SIMS higher are investigated. This apparatus is applied to silicon device analysis, i. e. silicon single crystal doped boron, arsenic or antimony, LSI and IC.Mass spectra of silicon device and Auger spectra of aluminum and silicon are obtained simultaneous using of9keV argon ion and9keV electron microprobes, the ion microprobe and the electron microprobe. A surface of LSI device is observed as scanning electron microscopic, scanning ion microscopic and specific ion images. A confirmation of area bombarded by ion and a selection of area to be analyzed are proceeded with SEM.
Journal
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- Journal of the Mass Spectrometry Society of Japan
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Journal of the Mass Spectrometry Society of Japan 25 (4), 325-349, 1977
The Mass Spectrometry Society of Japan
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Details 詳細情報について
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- CRID
- 1390282681474077184
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- NII Article ID
- 130002033387
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- NII Book ID
- AN0010555X
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- ISSN
- 05428645
- 18804225
- 18843271
- 13408097
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- NDL BIB ID
- 1918235
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed