プラズマイオン注入•堆積法の新しい展開

DOI NDLデジタルコレクション Web Site Web Site 被引用文献5件 参考文献58件
  • 行村 建
    同志社大学工学部電気工学科
  • WEI Ronghua
    Surface Engineering Section, Materials Engineering Department, Southwest Research Institute

書誌事項

タイトル別名
  • A New Trend of Plasma-Based Ion Implantation and Deposition
  • プラズマイオン注入・堆積法の新しい展開
  • プラズマイオン チュウニュウ タイセキホウ ノ アタラシイ テンカイ

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抄録

Plasma-Based Ion Implantation and Deposition (PBII&D) has been developed for surface modification of three dimensional materials immersed in plasma. The ions are implanted into the material to which a train of pulsed voltage are directly applied so as to make an ion sheath around the surface of the material. During the ion implantation, plasma species and their compound materials are simultaneously deposited on the materials. This is a cost-effective and simple surface modification system. Conformal ion implantation can be carried out by this method. Metallic arcs such as cathodic arc and gas discharges using organic metallic gas have been used. In addition to the negative bias application system for extracting positive ions, positive pulse application system to extract electrons to heat the materials and positive pulsed bias method have been also developed. As industrial applications, the surface modification of inside pipes by PBII&D is introduced.

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