A New Trend of Plasma-Based Ion Implantation and Deposition

DOI NDL Digital Collections Web Site Web Site 5 Citations 58 References
  • YUKIMURA Ken
    Department of Electrical Engineering, Doshisha University
  • WEI Ronghua
    Surface Engineering Section, Materials Engineering Department, Southwest Research Institute

Bibliographic Information

Other Title
  • プラズマイオン注入•堆積法の新しい展開
  • プラズマイオン注入・堆積法の新しい展開
  • プラズマイオン チュウニュウ タイセキホウ ノ アタラシイ テンカイ

Search this article

Abstract

Plasma-Based Ion Implantation and Deposition (PBII&D) has been developed for surface modification of three dimensional materials immersed in plasma. The ions are implanted into the material to which a train of pulsed voltage are directly applied so as to make an ion sheath around the surface of the material. During the ion implantation, plasma species and their compound materials are simultaneously deposited on the materials. This is a cost-effective and simple surface modification system. Conformal ion implantation can be carried out by this method. Metallic arcs such as cathodic arc and gas discharges using organic metallic gas have been used. In addition to the negative bias application system for extracting positive ions, positive pulse application system to extract electrons to heat the materials and positive pulsed bias method have been also developed. As industrial applications, the surface modification of inside pipes by PBII&D is introduced.

Journal

Citations (5)*help

See more

References(58)*help

See more

Keywords

Details 詳細情報について

Report a problem

Back to top