Synthesis of the Polymers Containing Sulfide Bonds in the Main Chain and Application as Positive Type Resist
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- TANAKA Hideaki
- National Chemical Laboratory for Industry
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- KOBAYASHI Rikio
- National Chemical Laboratory for Industry
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- KOMIZU Hideo
- National Chemical Laboratory for Industry
Bibliographic Information
- Other Title
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- スルフィド結合を有する高分子の合成と主鎖切断型ポジ型レジストへの応用
- スルフィド ケツゴウ オ ユウスル コウブンシ ノ ゴウセイ ト シュサ セツ
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Description
Five kinds of polymers containing sulfide bonds (C-S-C) in the main chain were synthesized in water emulsion of thiirane compounds with the use of CdSi catalyst. The polymers are degradable by the irradiation of UV light, γ-ray, or electron beam, and the decrease of the molecular weight was analyzed by Gel-Permiation Chromatography. The quantum yield of the photoscission is around 0.1 and the G value of the scission is about 8 for the sulfide polymers. IR spectra of the gas evolved by the UV irradiation showed the existence of C-H and carbon-carbon double bonds. Poly (2-ethyl, 2-methyl thiirane) formed a noncrystalline film on a plate with a higher sensitivity to the electron beam than poly (methyl methacrylate) film.
Journal
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- KOBUNSHI RONBUNSHU
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KOBUNSHI RONBUNSHU 37 (4), 269-274, 1980
The Society of Polymer Science, Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390282681498051712
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- NII Article ID
- 130004033904
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- NII Book ID
- AN00085011
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- ISSN
- 18815685
- 03862186
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- NDL BIB ID
- 2179252
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL Search
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed