The Adsorption Mechanism of 6-Diallylamino-1,3,5-triazine-2,4-dithiol on Iron Surfaces by Conventional Vacuum Deposition.
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- Suzuki Kazunori
- Iwate Industrial Research Institute
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- MORI Kunio
- Department of applied chemistry, Faculty of Engineering Iwate University
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- Ye RONGBIN
- Iwate Industrial Promotion Center
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- HIRAHARA Hidetoshi
- Department of applied chemistry, Faculty of Engineering Iwate University
Bibliographic Information
- Other Title
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- 6‐ジアリルアミノ‐1,3,5‐トリアジン‐2,4‐ジチオール真空蒸着被膜の鉄表面への吸着機構
Abstract
Films of 6-diallylamino-1, 3, 5-triazine-2, 4-dithiol (DA) were formed on iron substrates by the conventional vacuum deposition method. haracteristics of adsorbed DA were investigated using ellipsometry, FTIR-RAS, and XPS to examine the influence of substrates on adsorbed water. The ion substrates were washed with acetone (unbaked substrates), and baked under an ultra high vacuum condition to remove adsorbed water (baked substrates). The results showed that DA mlecules easily adsorbed chemically on the unbaked substrate, by the formation of disulfide, sulfur-carbon, and mercaptide bonds. The reactions of DA on the surface would be predominated by a free radical process. This mechanism was proposed to be originated by radical generation by molecular collision with DA to hydrous ferric oxide (FeOOH) surfaces.
Journal
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- KOBUNSHI RONBUNSHU
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KOBUNSHI RONBUNSHU 60 (3), 108-114, 2003
The Society of Polymer Science, Japan
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Details 詳細情報について
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- CRID
- 1390282681498787712
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- NII Article ID
- 130004035595
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- ISSN
- 18815685
- 03862186
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- Text Lang
- ja
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- Data Source
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- JaLC
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed