静的融点以上における高分子量ナイロン６の延伸応力と構造発現の関係
書誌事項
- タイトル別名
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- Relation between Drawing Stress and Structural Development of High Molecular Weight Nylon 6.
説明
Films of high molecular weight Nylon 6 (I.V. =8.6-11.3 dL/g) were uniaxially drawn by a tensile force at 240°C, above the static melting temperature (>220°C) of the undrawn sample. Relations between drawing stress (δd) and structural development in the resultant drawn films were evaluated mainly by WAXD measurements and tensile tests. Both α and γ-crystals were formed in the drawn samples. The fraction of the α-crystals in the crystalline phases was dependent on the δd, the higher the δd, the higher was the fraction of α-crystals, leading to the increase of tensile modulus. In this work, the maximum of the δd was about 3.5 MPa. In this case, the fraction of the α-crystals in the crystalline phase was about 0.75. The fraction was increased further by a heat treatment under the high stress. By the annealing of the drawn samples, a part of the oriented amorphous chains and γ-crystals were transformed into α-crystals. As a result, the tensile modulus was increased up to 18.6 GPa.
収録刊行物
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- 高分子論文集
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高分子論文集 61 (6), 346-351, 2004
公益社団法人 高分子学会
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キーワード
詳細情報 詳細情報について
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- CRID
- 1390282681500865536
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- NII論文ID
- 130004035669
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- ISSN
- 18815685
- 03862186
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可
