Latest Technology of Stress Buffer Material for Semiconductor Application
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- Katoh Kohji
- Hitachi Chemical DuPont MicroSystems Ltd.
Bibliographic Information
- Other Title
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- 半導体用ストレスバッファー材料の最新動向
- ハンドウタイヨウ ストレスバッファー ザイリョウ ノ サイシン ドウコウ
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Abstract
Because polyimide (PI) / polybenzoxazole (PBO) materials make semiconductor reliability drastically improved, they have been applied to stress buffer layer for over 30 years. Their purpose used to prevent IC chip from mechanical attack by molding compound filler. In recent years, PI / PBO are required to perform stress relief. In addition to this, they have come to be used as dielectric layer for Cu redistribution layer application as semiconductor package type changes. Therefore, various properties and balanced performances are necessary for PI / PBO materials.<br>This paper reviews latest PI / PBO technologies in semiconductor application.
Journal
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- NIPPON GOMU KYOKAISHI
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NIPPON GOMU KYOKAISHI 85 (2), 40-45, 2012
THE SOCIRETY OF RUBBER SCIENCE AND TECHNOLOGYY, JAPAN
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Details 詳細情報について
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- CRID
- 1390282681538735744
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- NII Article ID
- 10030144036
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- NII Book ID
- AN00269207
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- COI
- 1:CAS:528:DC%2BC38XotVOhurw%3D
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- ISSN
- 18840442
- 0029022X
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- NDL BIB ID
- 023420677
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed