Replication of a Surface Relief Hologram

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  • IWATA Fujio
    Central Research Laboratories, Toppan Printing Co.
  • TSUJIUCHI Jumpei
    Imaging Science & Engineering Laboratory, Faculty of Engineering, Tokyo Institute of Technology

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Other Title
  • 表面レリーフ型ホログラムの複製
  • ヒョウメン レリーフガタ ホログラム ノ フクセイ

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Description

Increase in sensitivity and improvement of linearity for the photoresist hologram by the postexposure method are analytically studied. It becomes clear that the experimental values agree with the theoretical one approximately.<BR>Besides, the characteristics of the replica hologram by embossing method is experimentally studied.<BR>In this result, it is found that the replica hologram is copied perfectly even in deep grooves.

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