Radiation hydrodynamic simulation of efficient extreme ultraviolet light plasma

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  • 輻射(ふくしや)流体シミュレーションによる極端紫外光源プラズマの挙動解析
  • 輻射(ふくしゃ)流体シミュレーションによる極端紫外光源プラズマの挙動解析
  • フクシャ(フクシャ)リュウタイ シミュレーション ニ ヨル キョクタン シガイ コウゲン プラズマ ノ キョドウ カイセキ

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Abstract

<p>Laser-produced tin plasmas, emitting extreme ultraviolet (XUV) light with a 13.5 nm wavelength and 2% bandwidth, are expected to be used in 10 nm-level next generation semiconductor lithography. However, the current XUV output power is not large enough to satisfy the requirements for mass production. To fulfill the requirements and optimize the conditions, we must have a better understanding of the “dynamics of laser-irradiated tin droplets” and “XUV emission from tin plasma irradiated by a CO2 laser”. Therefore, we carried out simulations of these problems using our radiation hydrodynamics simulation code. We present the results of the simulations and describe the optimization conditions.</p>

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  • Oyo Buturi

    Oyo Buturi 83 (9), 741-746, 2014-09-10

    The Japan Society of Applied Physics

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