Microfabrication of the Array of Convex Microstructures of Silicon Using the Combined Etching Process with Bilayer Etching Mask

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  • MURAKAMI Sunao
    Department of Mechanical Information Science and Technology, Faculty of Computer Science and Systems Engineering, Kyushu Institute of Technology
  • ARAKI Kazuhiro
    Department of Mechanical Information Science and Technology, Faculty of Computer Science and Systems Engineering, Kyushu Institute of Technology
  • YAMAMOTO Shusuke
    Department of Mechanical Information Science and Technology, Faculty of Computer Science and Systems Engineering, Kyushu Institute of Technology
  • ITO Takahiro
    Department of Mechanical Information Science and Technology, Faculty of Computer Science and Systems Engineering, Kyushu Institute of Technology

Description

<p>In this study, we have fabricated the arrays of convex microstructures on single crystal silicon (SCS) substrates using the procedure which includes two types of anisotropic etching process. We firstly fabricated the arrays of micropillars with vertical sidewalls using deep reactive ion etching (D-RIE) process of SCS. After that, we etched the micropillars additionally using the anisotropic wet etching process of SCS. We investigated the etched shape of the convex microstructures in the microfabrication procedure, and successfully fabricated the arrays with bilayer etching masks composed of the layer of aluminum and silicon dioxide with the controlled thickness.</p>

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