ビスフェノールC とビス（メトキシメチル）ビフェニルを用いた ノボラック樹脂の合成と性質

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書誌事項

タイトル別名
  • Synthesis and Properties of Bisphenol C-Bis(methoxymethyl)biphenyl Novolac Resin
  • ビスフェノールCとビス(メトキシメチル)ビフェニルを用いたノボラック樹脂の合成と性質 : ビスフェノール類に着眼した柔軟性をもつフォトレジスト材の開発
  • ビスフェノール C ト ビス(メトキシメチル)ビフェニル オ モチイタ ノボラック ジュシ ノ ゴウセイ ト セイシツ : ビスフェノールルイ ニ チャクガン シタ ジュウナンセイ オ モツ フォトレジストザイ ノ カイハツ
  • Development of Photo-resist Material Having Flexibility Noticed with Bisphenol unit
  • ―ビスフェノール類に着眼した柔軟性をもつフォトレジスト材の開発―

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<p>As we proceeded with the development of a novolac resin with flexibility and high lithography performance, we focused on adopting a linear polymer structure with few branched structures as used in a dry film resist. BisC/BMMB and (BisC/PY)/BMMB novolac resins with 2,2-bis (4-hydroxy-3-methylphenyl) propane (BisC) and/or a mixture of BisC and pyrogallol (PY) as the PhOH component and 4,4'-bis(methoxymethyl)-1,1'-biphenyl (BMMA) as the comonomer, i.e., novolac resins with bulky isopropylidene groups and rigid BMMB components in the molecular chain backbone, were studied. For both novolac resins, the Mw increased as the molar ratio of BMMB component increased. Though the maximum Mw of BisC/BMMB and (BisC/PY)/BMMB novolac resin soluble in aqueous alkaline solution was approximately 1500 and 3800, respectively, and the both dissolving rate for alkaline aqueous solutions (DR) were showed relatively slow, 0.03> (Å/s). BisC/Form and PY/BMMB novolac resins having liner polymer structure also investigate. The order of flexibility including them were BisC/BMMB novolac resin < (BisC/PY)/BMMB novolac resin≒BisC/Form novolac resin < PY/BMMB novolac resin. The difference in the flexibility of these novolac resins was found to be largely due to the formation of intramolecular hydrogen bonds. Both of BisC/BMMB and (BisC/PY)/BMMB novolac resins did not show good lithography ability.</p>

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