Present Status of EUV Lithography and Future Prospect on a High Power EUV-FEL Based on ERL Technology

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  • EUVリソグラフィの現状とERLを用いた大強度EUV-FELの展望
  • EUV リソグラフィ ノ ゲンジョウ ト ERL オ モチイタ ダイ キョウド EUV-FEL ノ テンボウ

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<p>It is essential to develop the high power EUV light source up to 1 kW to realize the 3 nm node to reduce stochastic variation and achieve higher throughput. To this end, our group has proposed an energy recovery linac (ERL)-based free electron laser (FEL) which will produce more than 10 kW EUV light to provide the light into several scanners. This article describes the present status of the EUV Lithography which is a starting point of HVM, and the future prospect of a high power EUV-FEL light source based on ERL accelerator technologies.</p>

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