Characterizations of p-type B-doped BaSi<sub>2</sub> films formed by sputtering
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- Hasebe H.
- Univ. Tsukuba
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- Kido K.
- Univ. Tsukuba
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- Mesuda M.
- Tosoh Corporation
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- Toko K.
- Univ. Tsukuba
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- Suemasu T.
- Univ. Tsukuba
Bibliographic Information
- Other Title
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- スパッタ法によるp型B-doped BaSi<sub>2</sub>膜の作製と評価
Journal
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- Proceedings of the Annual Meeting of the Japan Photovoltaic Society
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Proceedings of the Annual Meeting of the Japan Photovoltaic Society 2 (0), 111-111, 2022-06-24
The Japan Photovoltaic Society
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Details 詳細情報について
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- CRID
- 1390293334799669632
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- ISSN
- 24366498
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- Text Lang
- ja
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- Data Source
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- JaLC
