Chemical reaction analysis of chemical amplified EUV resist by evaluating the thickness loss due to deprotection reaction
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- Emura Kazuya
- Univ. of Hyogo
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- Watanabe Takeo
- Univ. of Hyogo
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- Yamaguchi Masato
- Univ. of Hyogo
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- Tanino Hirohito
- Univ. of Hyogo
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- Hukui Tsubasa
- Univ. of Hyogo
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- Siono Daiju
- Tokyo Ohka
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- Haruyama Yuichi
- Univ. of Hyogo
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- Muramatu Yasuji
- Univ. of Hyogo
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- Ohmori Katsumi
- Tokyo Ohka
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- Sato Kazufumi
- Tokyo Ohka
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- Harada Tetsuo
- Univ. of Hyogo
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- Kinoshita Hiroo
- Univ. of Hyogo
Bibliographic Information
- Other Title
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- 脱保護反応に起因した膜減り量評価による化学増幅系EUV用レジストの反応解析
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2014.1 (0), 1493-1493, 2014-03-03
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390296685878932608
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC
