Zrイオンを含む非懸濁溶液からパルス電解法により作製したZn系複合電析膜の微細構造と耐食性

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  • Micro Structure and Corrosion Resistance of Zn Composites Films Produced by Pulse Electrolysis from a Insoluble Particle-free Solution Containing Zr Ions
  • Zr イオン オ フクム ヒケンダク ヨウエキ カラ パルス デンカイホウ ニ ヨリ サクセイ シタ Znケイ フクゴウデンセキマク ノ ビサイ コウゾウ ト タイショクセイ

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<p>The electrodeposition of an Zn–Zr compound composite is performed under pulsed and double-pulsed current conditions at 313 K in unagitated pH 2 sulfate solutions containing Zn2+ and ZrO2+ ions and polyethylene glycol. Under constant-current electrolysis at 5000 A·m−2, coarse granular partial deposits containing Zr compounds are observed. Under pulse electrolysis, such coarse deposits are observed rarely; however, both deposited films containing Zr compounds and exfoliated films are observed. On the contrary, in double-pulse electrolysis at high (5000 A·m−2) and low (500 A·m−2) current densities, coarse deposits are not observed while fine-particle deposits containing Zr compounds are observed. In double-pulse electrolysis at low current densities, the rate of hydrogen evolution decreases and Zn is deposited without the codeposition of Zr compounds; therefore, the continuous hydrogen evolution is suspended in some areas. That is, the area of hydrogen evolution appears to be random. Although Zr compounds are usually concentrated at the upper regions of the deposited films, regardless of the electrolysis method, it is found to have been codeposited even in the inner regions under double-pulse electrolysis. The corrosion current density in 3 mass% NaCl solution is the smallest for the films produced by double-pulse electrolysis, when comparing with the films obtained by pulse electrolysis and constant-current electrolysis. This can be attributed to the suppression of the reduction reaction of dissolved oxygen.</p>

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