Zrイオンを含む非懸濁溶液からパルス電解法により作製したZn系複合電析膜の微細構造と耐食性
書誌事項
- タイトル別名
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- Micro Structure and Corrosion Resistance of Zn Composites Films Produced by Pulse Electrolysis from a Insoluble Particle-free Solution Containing Zr Ions
- Zr イオン オ フクム ヒケンダク ヨウエキ カラ パルス デンカイホウ ニ ヨリ サクセイ シタ Znケイ フクゴウデンセキマク ノ ビサイ コウゾウ ト タイショクセイ
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説明
<p>Electrodeposition of Zn–Zr compound composite was performed under pulsed and double pulsed current conditions at 313 K on unagitated pH 2 sulfate solutions containing Zn2+, ZrO2+ ions and a polyethylene glycol (PEG). At constant current density of 5000 A∙m−2, the coarse granular deposits containing Zr compound existed partially. Meanwhile, in pulse electrolysis, the coarse deposits were rarely seen and the both areas of deposited films containing Zr compound and its films being exfoliated were observed. On the contrary, in double pulse electrolysis of high current density (5000 A∙m−2) and low current density (500 A∙m−2), the coarse deposits were not observed and the fine particle deposits containing Zr compound were present. In double pulse electrolysis, since at low current density, the rate of hydrogen evolution decreases and Zn deposits without co-deposition of Zr compound, the continuous hydrogen evolution is suspended in some areas and the area of hydrogen evolution seems to become random. Although Zr compound concentrated at upper area of deposited films regardless of electrolytic method, it codeposited even at inner part with double pulse electrolysis. The corrosion current density in 3 mass% NaCl solution was the smallest for the films produced by double pulse electrolysis, comparing with films obtained by pulse electrolysis and constant current electrolysis. This is attributed to reduction reaction of dissolved oxygen being suppressed.</p>
収録刊行物
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- 鉄と鋼
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鉄と鋼 109 (8), 684-694, 2023-08-01
一般社団法人 日本鉄鋼協会
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詳細情報 詳細情報について
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- CRID
- 1390296962548557440
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- NII書誌ID
- AN00151251
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- ISSN
- 18832954
- 00211575
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- HANDLE
- 2324/7172656
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- NDL書誌ID
- 032997202
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- IRDB
- NDLサーチ
- Crossref
- OpenAIRE
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- 抄録ライセンスフラグ
- 使用不可