HfO<sub>2</sub>/Si構造における界面層作成手法の検討
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2012.2 (0), 2688-2688, 2012-08-27
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1390297681111855744
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC