Fabrication of carbon nanowalls by radical-controlled plasma
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- HORI Masaru
- Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University
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- HIRAMATSU Mineo
- Department of Electrical and Electronic Engineering, Faculty of Science and Technology, Meijo University
Bibliographic Information
- Other Title
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- プラズマ中のラジカル制御によるカーボンナノウォールの合成
- プラズマチュウ ノ ラジカル セイギョ ニ ヨル カーボン ナノウォール ノ ゴウセイ
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Abstract
<p>The idea of radical-controlled processing is that plasma processing is controlled by adjusting internal parameters such as electron density, electron temperature and the densities of important radicals and ions while carrying out in situ monitoring. We have proposed a novel method of plasma processing, i.e., radical-controlled processing using a radical injection technique, and have demonstrated the successful formation of carbon nanowalls (CNWs) and the control of their structures by fluorocarbon plasma-enhanced chemical vapor deposition assisted by the injection of hydrogen radicals. CNWs can be described as two-dimensional graphite nanostructures with edges, which are composed of stacks of plane graphene sheets almost perpendicular to the substrate, forming a wall structure with a high aspect ratio. The radical injection technique enabled us to control the densities of multiple radicals individually and has great potential for the fabrication of novel nanometer-scaled functional materials.</p>
Journal
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- Oyo Buturi
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Oyo Buturi 77 (4), 406-410, 2008-04-10
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1390564227312346112
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- NII Article ID
- 10021109074
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- NII Book ID
- AN00026679
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- ISSN
- 21882290
- 03698009
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- NDL BIB ID
- 9457836
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- CiNii Articles
- KAKEN
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- Abstract License Flag
- Disallowed
