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Leading Edge Short Wavelength Light Source (DUV/EUV for High Volume Semiconductor Manufacturing)
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- Mizoguchi Hakaru
- Gigaphoton Inc.
Bibliographic Information
- Other Title
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- 最先端短波長光源（DUV, EUV）と半導体製造への応用
Description
<p>Recent semiconductor volume manufacturing is supported by DUV (KrF/ArF) light source. and next generation will be supported by EUV lightsource. I will discuss about DUV progress and its appriction to nano direct processing. We have demonstrated actual collector mirror reflectivity degradation rate is less than 0.4%/Gp by using real collector mirror around 125W (at I/F clean) in burst power during 30 Billion pulses operation. Recently we have redefined target power higher >330W and its development plan.</p>
Journal
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- Abstract book of Annual Meeting of the Japan Society of Vacuum and Surface Science
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Abstract book of Annual Meeting of the Japan Society of Vacuum and Surface Science 2019 (0), 1Ba01-, 2019
The Japan Society of Vacuum and Surface Science
- Tweet
Details 詳細情報について
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- CRID
- 1390564227329111168
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- NII Article ID
- 130007737444
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- ISSN
- 24348589
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- Text Lang
- ja
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- Data Source
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- JaLC
- CiNii Articles
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- Abstract License Flag
- Disallowed
