Fabrication and Characterization of BiFe<sub>0.9</sub>Co<sub>0.1</sub>O<sub>3</sub> Nanodot Array by Using Anodized Alumina Mask

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  • OZAWA Keita
    Laboratory for Materials and Structures Tokyo Institute of Technology
  • KATSUMATA Marin
    Laboratory for Materials and Structures Tokyo Institute of Technology
  • SHIGEMATSU Kei
    Laboratory for Materials and Structures Tokyo Institute of Technology Kanagawa Institute of Industrial Science of Technology
  • AZUMA Masaki
    Laboratory for Materials and Structures Tokyo Institute of Technology Kanagawa Institute of Industrial Science of Technology

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  • 陽極酸化アルミナマスクを用いたBiFe<sub>0.9</sub>Co<sub>0.1</sub>O<sub>3</sub>ナノドットの作製・評価
  • 陽極酸化アルミナマスクを用いたBiFe[0.9]Co[0.1]O₃ナノドットの作製・評価
  • ヨウキョク サンカ アルミナマスク オ モチイタ BiFe[0.9]Co[0.1]O ₃ ナノドット ノ サクセイ ・ ヒョウカ

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<p>Magnetization reversal by electric field has recently been confirmed in cobalt-substituted bismuth ferrite (BiFe0.9Co0.1O3) thin films, which would be applicable to ultra-low energy consumption memory devices. In this study, we fabricated the nanodot array using pulsed laser deposition method with an anodized porous alumina mask to realize a unit of BiFe0.9Co0.1O3 with single ferroelectric domain. BiFe0.9Co0.1O3/SrRuO3 nanodots with a diameter of ~60 nm which is as small as a typical scale of ferroelectric domain in BiFe0.9Co0.1O3 films were successfully obtained.</p>

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