Crystallinity-Induced Acceleration of Intergranular Cracking in Thin-Film Interconnections under High Current Density

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  • AKASAKI Shota
    Dept. of Finemechanics, Grad. School of Eng., Tohoku Univ.
  • SUZUKI Ken
    Fracture and Reliability Research Institute, Tohoku University
  • MIURA Hideo
    Fracture and Reliability Research Institute, Tohoku University

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  • 高電流密度下における薄膜配線粒界割れ現象に及ぼす結晶品質の影響

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