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- Kim Byunghoon
- Interdisciplinary Graduate School of Engineering Sciences Kyushu University
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- Akiyama Yasunobu
- Institute of Advanced Material Study Kyushu University
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- Imaishi Nobuyuki
- Institute of Advanced Material Study Kyushu University
Bibliographic Information
- Other Title
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- 非線型の表面反応を示す系に対するカバレッジのシミュレーション
- ヒセンケイ ノ ヒョウメン ハンノウ オ シメス ケイ ニ タイスル カバレッ
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Abstract
Step coverage simulation code was newly developed. This code, which is a kind of test particle Monte Carlo method, can simulate the step coverage with non-liner surface reaction, for example Tungsten (W) thermal Chemical Vapor Deposition (CVD) using hydrogen (H_2) and hexafluoro Tungsten (WF_6). The availability of this code was examined by the comparison of the experimental obtained step coverage and simulated one through W-CVD. The simulation results well explained the WF_6 concentration dependency of step coverage of W film grown on the silicon substrate. The step coverage of film grown at 773K and in low WF_6 concentration becomes poor coverage, however the film grown in high WF_6 concentration shows good coverage. Under high WF_6 concentration, the growth rate reaches the ceiling, namely the growth rate have the same value on the any position in the trench, and consequently the step coverage became good.
Journal
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- 九州大学機能物質科学研究所報告
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九州大学機能物質科学研究所報告 12 (1), 15-19, 1998-07-31
Institute of Advanced Material Study Kyushu University
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Details 詳細情報について
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- CRID
- 1390572174788956288
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- NII Article ID
- 110006177540
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- NII Book ID
- AN10060378
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- ISSN
- 09143793
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- DOI
- 10.15017/7889
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- HANDLE
- 2324/7889
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- NDL BIB ID
- 4544948
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- Text Lang
- ja
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- Data Source
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- JaLC
- IRDB
- NDL
- CiNii Articles
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- Abstract License Flag
- Allowed