CF4プラズマにおけるCF2ラジカルに及ぼす壁温度加熱の影響

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タイトル別名
  • Influence of Wall Heating on CF2 Radical in CF4 Plasma
  • CF4 プラズマ ニ オケル CF2 ラジカル ニ オヨボス カベオンド カネツ ノ エイキョウ

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説明

The behavior of CF2 radicals was studied as a function of the temperature of the wall of the cylindrical cathode in de-pulsed CF4 hollow cathode discharge plasma. Laser-induced fluorescence was used to examine the temporal behavior and radial distribution of CF2 radical density. The CF2 radical density increased about six times of magnitude by changing the wall temperature between 22℃ and 100℃. The surface loss probability for CF2 radicals was estimated from the radial distribution of the CF2 radical density in the active plasma. The results show that the increase of the CF2 radical density in the heated wall can be interpreted as a decrease in the surface loss probability of CF2 radicals.

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