Optimization of Nozzle Shape by Flashing Spray CVD Method

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  • フラッシングスプレーCVD法におけるノズル形状の最適化
  • フラッシングスプレーCVDホウ ニオケル ノズル ケイジョウ ノ サイテキカ

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Abstract

The authors proposed the novel chemical vapor deposition (CVD) by using flash boiling spray. In the present study the flashing spray CVD (FS-CVD) is expected to improve several kind of problems such as decomposition of the precursor at vaporizer and supply line. With the proposed method, the liquid precursors are supplied directly through an injector, which is installed at the CVD chamber as an unsteady and intermittent spray into lower ambient chamber. Furthermore, low volatile precursors can be converted into higher volatile properties by mixing the volatile solution at the vapor-liquid equilibrium. In the experiment, TEOS and n-pentane mixed solution were used. The best nozzle shape was estimated from magnification photography image, vapor distribution, evaporation characteristics, and liquid penetration. All of which were taken by the image of LIF and Mie scattering, where the film is formed by FS-CVD with optimized nozzle.

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