Epitaxial growth of γ-(Al<sub>x</sub>Ga<sub>1-x</sub>)<sub>2</sub>O<sub>3</sub> alloy thin films by mist chemical vapor deposition
-
- Horie Ryuto
- Kyoto Inst. Tech.
-
- Tahara Daisuke
- Kyoto Inst. Tech.
-
- Nishinaka Hiroyuki
- Kyoto Inst. Tech.
-
- Yoshimoto Masahiro
- Kyoto Inst. Tech.
Bibliographic Information
- Other Title
-
- ミストCVD法によるγ-(Al<sub>x</sub>Ga<sub>1-x</sub>)<sub>2</sub>O<sub>3</sub>混晶薄膜成長
Journal
-
- JSAP Annual Meetings Extended Abstracts
-
JSAP Annual Meetings Extended Abstracts 2020.1 (0), 3521-3521, 2020-02-28
The Japan Society of Applied Physics
- Tweet
Details 詳細情報について
-
- CRID
- 1390573715144293376
-
- ISSN
- 24367613
-
- Text Lang
- ja
-
- Data Source
-
- JaLC