Paramagnetic point defects in silicon nitride films annealed at 1050℃
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- Yamaguchi Shinji
- Tokai Univ.
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- Kazumi Osamu
- Tokai Univ.
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- Kobayashi Kiyoteru
- Tokai Univ.
Bibliographic Information
- Other Title
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- 1050℃熱処理において生成したシリコン窒化膜の常磁性欠陥
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2018.1 (0), 3098-3098, 2018-03-05
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1390575130485734016
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC