Neon GFIS Gas Assisted Etch and Beam Induced Deposition -Characterization for Semiconductor Applications-
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- Livengood Richard H.
- Intel Corporation
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- Tan Shida
- Intel Corporation
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- Hallstein Roy M.
- Intel Corporation
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- Ali Waqas
- Intel Corporation
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2017.1 (0), 269-269, 2017-03-01
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390575661591272064
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- ISSN
- 24367613
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- Text Lang
- en
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- Data Source
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- JaLC