- 【Updated on May 12, 2025】 Integration of CiNii Dissertations and CiNii Books into CiNii Research
- Trial version of CiNii Research Automatic Translation feature is available on CiNii Labs
- Suspension and deletion of data provided by Nikkei BP
- Regarding the recording of “Research Data” and “Evidence Data”
Formation of SiO₂ Scale in High-Temperature Oxidation of Wsi₂
Search this article
Description
In order to clarify the relationship between evaporation of WO₃ and formation of a SiO₂ scale in WSi₂, high temperature oxidation tests of WSi₂ were carried out at the temperature range from 773 to 1773 K in air. The pronounced effect of the evaporation of WO₃ on the structure of oxide scale was found at temperatures higher than 1273 K, and a protective SiO₂ scale was formed above 1573 K. The requisite evaporation rate and the vapor pressure of WO₃ for the formation of a protective SiO₂ scale were estimated to be about 10⁻⁴kgm⁻²s⁻¹ and 10 Pa, respectively.
Journal
-
- Transactions of JWRI
-
Transactions of JWRI 36 (2), 51-55, 2007-12
Joining and Welding Research Institute, Osaka University
- Tweet
Details 詳細情報について
-
- CRID
- 1390575727755410176
-
- NII Article ID
- 120004837968
-
- NII Book ID
- AA00867058
-
- DOI
- 10.18910/3766
-
- HANDLE
- 11094/3766
-
- ISSN
- 03874508
-
- Text Lang
- en
-
- Article Type
- departmental bulletin paper
-
- Data Source
-
- JaLC
- IRDB
- CiNii Articles
- OpenAIRE