Formation of SiO₂ Scale in High-Temperature Oxidation of Wsi₂

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Description

In order to clarify the relationship between evaporation of WO₃ and formation of a SiO₂ scale in WSi₂, high temperature oxidation tests of WSi₂ were carried out at the temperature range from 773 to 1773 K in air. The pronounced effect of the evaporation of WO₃ on the structure of oxide scale was found at temperatures higher than 1273 K, and a protective SiO₂ scale was formed above 1573 K. The requisite evaporation rate and the vapor pressure of WO₃ for the formation of a protective SiO₂ scale were estimated to be about 10⁻⁴kgm⁻²s⁻¹ and 10 Pa, respectively.

Journal

  • Transactions of JWRI

    Transactions of JWRI 36 (2), 51-55, 2007-12

    Joining and Welding Research Institute, Osaka University

Details 詳細情報について

  • CRID
    1390575727755410176
  • NII Article ID
    120004837968
  • NII Book ID
    AA00867058
  • DOI
    10.18910/3766
  • HANDLE
    11094/3766
  • ISSN
    03874508
  • Text Lang
    en
  • Article Type
    departmental bulletin paper
  • Data Source
    • JaLC
    • IRDB
    • CiNii Articles
    • OpenAIRE

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