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- Matsuura Yukihito
- Department of Chemical Engineering, National Institute of Technology, Nara College
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- Higashide Yuuri
- Department of Chemical Engineering, National Institute of Technology, Nara College
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- Takagishi Yuki
- Department of Chemical Engineering, National Institute of Technology, Nara College
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- Ohkita Masanobu
- Frontier Materials Laboratories, Osaka, Gas Chemicals Co., Ltd.
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- Tachikawa Tomoharu
- Frontier Materials Laboratories, Osaka, Gas Chemicals Co., Ltd.
抄録
<p>We prepared polysilane–methacrylate copolymers using polysilane as the photoradical initiator. As polymerization is a radical reaction, the chemical structures of the arrangement of the polysilane block and methacrylate have not yet been clarified using various analytical methods. In this study, polysilane–(1-pyrene)methyl methacrylate copolymers were prepared to examine their chemical structure by photoluminescence measurements because the polysilane block and pyrene methacrylate units exhibit fluorescence. The fluorescence analysis revealed the formation of an excimer by the pyrene dimer. From the results, it was found that the pyrene methacrylate units were close to each other.</p>
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 35 (4), 347-350, 2022-12-16
フォトポリマー学会
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詳細情報 詳細情報について
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- CRID
- 1390576889053577216
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- ISSN
- 13496336
- 09149244
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- Crossref
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- 抄録ライセンスフラグ
- 使用不可