Measurement Precision of Relative Intensity Ratio of XPS Spectrum Peaks When Using W-Si Reference Material Excluding Ambiguity of Analysis Height Position of Sample Surfaces

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  • Kurokawa Akira
    National Institute of Advanced Industrial Science and Technology
  • Zhang Lulu
    National Institute of Advanced Industrial Science and Technology

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  • 試料の分析高さ位置の不確定性を除外したW-Si標準物質を 用いたXPSスペクトルピークの相対強度比の測定精度

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For quantitative analysis by XPS, the relative sensitivity factors are obtained by evaluating the measured intensity ratio of the pure substances of reference material. This method requires the same measurement conditions, such as the same sample height position for the reference materials. Tungsten dot-array composed of pure materials of tungsten and silicon can have the same height positions for both pure materials. Repeated measurements of the spectral peaks for five days showed that the peak intensity ratio of pure substances achieved the expanded uncertainty of 0.1% under the intermediate reproducibility conditions that had a daily difference in experimental room temperature change of 9˚C. The accuracy of XPS quantitative analysis has room for improvement up to this value.

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