Organic Photodiode Materials for Near-Infrared and Short-Wave Infrared Light Detection
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- NAKAYAMA Hidenori
- Mitsubishi Chemical Corporation
Bibliographic Information
- Other Title
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- 近赤外光・短波赤外光検出用有機光ダイオード材料の開発
Description
<p>We report on new materials for solution-processable organic photodiodes (OPDs) for near-infrared (NIR) and short-wave infrared (SWIR) detection compatible with CMOS image sensors. We selected a conventional structure (p-i-n) with a polymeric hole transport layer (HTL) that we originally made for organic light-emitting diodes. The HTL is free from acids and dopants, contributing to excellent device stability. The average roughness of the HTL on a 8-inch SiO2/Si wafer is less than 3 nm. For infrared sensing materials in the active layer, we developed novel non-fullerene acceptors (NFAs). An OPD targeting 940 nm achieved an external quantum yield (EQE) of 80% at the wavelength with a dark current in the order of 1×10-6 mA/cm-2 at -5 V. Another OPD targeting SWIR achieved EQE of 45% at 1,100 nm with a dark current of 4×10-5 mA/cm-2 at -5 V. Novel NFAs targeting even longer wavelengths are under development.</p>
Journal
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- POLYMERS
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POLYMERS 73 (2), 67-68, 2024
The Society of Polymer Science, Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390581854541488384
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- ISSN
- 21859825
- 04541138
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- Text Lang
- ja
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- Data Source
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- JaLC
- Crossref
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- Abstract License Flag
- Disallowed