Current status and issues of nano-imprint lithography

DOI Web Site
  • NAKAGAWA Masaru
    Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University

Bibliographic Information

Other Title
  • ナノインプリントリソグラフィの現状と今後の課題
  • ナノインプリントリソグラフィ ノ ゲンジョウ ト コンゴ ノ カダイ

Search this article

Abstract

<p>The current status of industrial applications of nano-imprint lithography is summarized briefly. Differences in the placement of a UV-curable resin on a substrate by ink-jet printing, spin coating, and screen printing are described in the context of UV nano-imprint lithography. Our study of screen printing, which is suitable for high-viscosity resins, is explained. Issues for industrial applications and sub-20nm patterning processes are described in terms of nano-imprint materials and processes comprising the mold, resin, coating, molding/demolding, dry etching, alignment, leveling/lamination, and defect inspection.</p>

Journal

  • Oyo Buturi

    Oyo Buturi 85 (6), 480-484, 2016-06-10

    The Japan Society of Applied Physics

Details 詳細情報について

Report a problem

Back to top