Application of TiO2 Film Deposited by Low Power Atmospheric Plasma Spray Equipment to DSSC
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- 安藤 康高
- 足利工業大学工学部
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- 野田 佳雅
- 足利工業大学工学部
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- Hadi A Hsian Sagr
- 足利工業大学大学院
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- Ronoh Geoffrey Kibiegon
- 足利工業大学大学院
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- Oluwafunmilade Alabi Kelvin
- 足利工業大学大学院
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- 小林 明
- Chulalongkorn University
Bibliographic Information
- Other Title
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- 低出力大気溶射装置を用いて作製したTiO2皮膜のDSSCへの応用
- テイシュツリョク タイキ ヨウシャ ソウチ オ モチイテ サクセイ シタ TiO ₂ ヒマク ノ DSSC エ ノ オウヨウ
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Abstract
In order to develop a dye-sensitized solar cell (DSSC) manufacturing process using low power atmospheric plasma spray (APS), porous TiO2 film deposition was performed by the developed low power APS equipment. Consequently, the porosity and Anatase/ rutile ratio of the TiO2 film increased with increasing spray distance. The DSSC included the deposited film as photo voltaic device generated higher open circuit voltage with increasing the spray distance: d. The open circuit voltage of the DSSC with the porosity of 26.5% was 241 mV at d= 220 mm. Besides, the DSSC included the porous TiO2 film of 18% porosity using NaCl powder addition of the feedstock TiO2, generated high open circuit voltage of 105 mV in comparison with that in case of pure TiO2 feed stock powder deposited at d= 100 mm. From these results, these techniques were proved to have high potential for deposition of porous TiO2 film for the photo voltaic device of the DSSC.
Journal
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- Applied Plasma Science
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Applied Plasma Science 25 (2), 65-70, 2017
Institute of Applied Plasma Science
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Keywords
Details 詳細情報について
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- CRID
- 1390846609783315968
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- NII Article ID
- 130007768820
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- NII Book ID
- AA12687461
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- ISSN
- 24351555
- 13403214
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- NDL BIB ID
- 029262911
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- CiNii Articles
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- Abstract License Flag
- Disallowed