Fabrication of Photocrosslinked Diarylfluorene Films with Episulfide Groups using Photobase Generators

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  • Okamura Haruyuki
    Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
  • Minokami Keiko
    Frontier Materials Laboratories, Osaka Gas Chemicals Co., Ltd.
  • Miyauchi Shinsuke
    Frontier Materials Laboratories, Osaka Gas Chemicals Co., Ltd.

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<p>We have developed photocrosslinked films containing a blend of dinaphthylfluorene having episulfide moieties and photobase generators by UV irradiation. The photogenerated amine from the photobase generators catalyzed the crosslinking reaction of the episulfide moieties. The photocrosslinking properties of the blends were significantly affected by the irradiation and baking conditions. We have successfully fabricated films with high refractive indices (1.714 at 589 nm) and a high thermal stability (5% weight loss temperature: 304 ℃).</p>

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