DC-Voltage-Induced High Oxygen Permeation through a Lanthanum Silicate Electrolyte with a Cerium Oxide Thin Film
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- IDE Shingo
- Department of Molecular and Material Sciences, Interdisciplinary Graduate School of Engineering Sciences, Kyushu University Mitsui-Mining & Smelting Co., Ltd.
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- WATANABE Ken
- Department of Advanced Materials Science and Engineering, Faculty of Engineering Sciences, Kyushu University
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- SUEMATSU Koichi
- Department of Advanced Materials Science and Engineering, Faculty of Engineering Sciences, Kyushu University
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- SETO Yasuhiro
- Mitsui-Mining & Smelting Co., Ltd.
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- YASHIMA Isamu
- Mitsui-Mining & Smelting Co., Ltd.
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- SHIMANOE Kengo
- Department of Advanced Materials Science and Engineering, Faculty of Engineering Sciences, Kyushu University
説明
<p>An oxide-ion-conductor-based oxygen pumping system can serve as an on-site oxygen separation system. Herein, we present the oxygen permeation capability of a Pt electrode/La-Sm-doped CeO2 (L-SDC) intermediate layer/c-axis-oriented La9.66Si5.3B0.7O26.14 (c-LSBO) solid electrolyte cell. A significant increase in the oxygen permeation flux is observed on applying a DC voltage of ≥4 V at temperatures <600 °C. A remarkably high flux of 5.2 mL cm−2 min−1 is obtained even at 500 °C. Furthermore, in situ X-ray diffraction studies under applied voltages reveal an increase in the lattice constant of L-SDC, accompanied by a drastic increase in the oxygen permeation flux, indicating the reduction of Ce4+ and formation of oxygen vacancies. These results suggest that the observed change in L-SDC under the applied voltage results in the in situ formation of a mixed electron- and oxide-ion-conducting L-SDC electrode, indicating that the oxygen reduction reaction and incorporation is significantly enhanced.</p>
収録刊行物
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- Electrochemistry
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Electrochemistry 89 (5), 427-432, 2021-09-05
公益社団法人 電気化学会
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詳細情報 詳細情報について
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- CRID
- 1390852252713605632
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- NII論文ID
- 130008084581
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- ISSN
- 21862451
- 13443542
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
- OpenAIRE
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- 抄録ライセンスフラグ
- 使用可