書誌事項
- タイトル別名
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- Low Pressure MOCVD of Li_2O or Li_2CO_3 thin films from Li(DPM)
- Li DPM オ ゲンリョウ ト スル Li2O アルイハ Li2CO3 ハク
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抄録
Low pressure metal organic chemical vapor deposition (LPMOCVD) of Li_2O solid thin films from Li(DPM) in nitrogen-oxygen or argon-oxygen atmosphere is experimentally investigated by using a small hot wall tubular type reactor. XRD and ESCA analyses revealed that Li_2CO_3 film grows in nitrogen-oxygen atmosphere and Li_2O grows in argon-oxygen atmosphere. The grown lithium oxide or carbonate reacts with silicon or silica base materials to produce silicates. The CVD model analysis by means of the well known micro trench method and Monte Carlo simulation was not fully successful, but set of data on gas phase reaction rate constant and surface reaction constant was obtained.
収録刊行物
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- 九州大学機能物質科学研究所報告
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九州大学機能物質科学研究所報告 11 (1), 7-12, 1997-07-25
九州大学機能物質科学研究所
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詳細情報 詳細情報について
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- CRID
- 1390853649765654400
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- NII論文ID
- 110006177514
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- NII書誌ID
- AN10060378
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- ISSN
- 09143793
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- DOI
- 10.15017/7863
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- HANDLE
- 2324/7863
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- NDL書誌ID
- 4265636
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- IRDB
- NDL
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用可