Study of ICP Production Mechanism by an Alternative Magnetic Field Measurement
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In order to study the plasma production mechanism, the profiles of the inductive electromotive forces (IEMF) penetrated in the inductively coupled plasma (ICP) are discussed. Magnetic probe measurements were performed in the high dense argon ICP using different types of antenna. The IEMF is an important factor to heat the electrons in the ICP production and is closely related to the ICP production efficiency. The edge type antenna gave the deep IEMF penetration, which showed a high plasma production efficiency at the same discharge power. The deep IEMF penetration could introduce the energy in the deeper region of the plasma and contributed to the efficient ICP production due to the suppression of the heated electron extinction at the quartz wall. The 100mm wide antenna showed that the IEMF attenuation coefficient at the antenna center level was higher than that at the antenna bottom-edge level, and it was the same as the IEMF attenuation coefficient of the edge type antenna. This result implied that the antenna bottom-edges were an important part of the ICP production.
収録刊行物
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- 九州大学大学院システム情報科学紀要
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九州大学大学院システム情報科学紀要 4 (2), 139-144, 1999-09-24
九州大学大学院システム情報科学研究院
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詳細情報 詳細情報について
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- CRID
- 1390853649773655552
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- NII論文ID
- 110000579921
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- NII書誌ID
- AN10569524
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- DOI
- 10.15017/1513725
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- ISSN
- 21880891
- 13423819
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- HANDLE
- 2324/1513725
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- NDL書誌ID
- 4896839
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- IRDB
- NDL
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用可
