Study of etching process using CHF3 gas condensed layer in cryogenic region
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- Hazumi Masahiro
- Nagoya Univ.
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- Selvaraj Suganthamalar
- cLPS, Nagoya Univ
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- Shih-Nan Hsiao
- cLPS, Nagoya Univ
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- Makoto Sekine
- cLPS, Nagoya Univ
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- Hisataka Hayashi
- cLPS, Nagoya Univ KIOXIA Corp
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- Toshiyuki Sasaki
- KIOXIA Corp
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- Chihiro Abe
- KIOXIA Corp
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- Takayoshi Tsutsumi
- cLPS, Nagoya Univ
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- Kenji Ishikawa
- cLPS, Nagoya Univ
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- Masaru Hori
- cLPS, Nagoya Univ
Bibliographic Information
- Other Title
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- 極低温領域におけるCHF3ガス凝縮層を用いたエッチングプロセスの研究
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2020.1 (0), 1581-1581, 2020-02-28
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390855190128548608
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC