Fabrication and Characterization of High-k Gate Insulating Films by RF-Sputtering Method
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- Tezuka Daiki
- National Institute of Technology, Tsuruoka College
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- Narisawa Kenshin
- National Institute of Technology, Tsuruoka College
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- Uchiyama Kiyoshi
- National Institute of Technology, Tsuruoka College
Bibliographic Information
- Other Title
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- RFスパッタ法を用いたHigh-k ゲート絶縁膜の作製と評価
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2020.1 (0), 1214-1214, 2020-02-28
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390855190136380288
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC