Physical properties of mist CVD-derived HZO films dependent on post deposition annealing by RTA
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- Fujiwara Yuki
- Kyoto Inst. Tech.
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- Junya Onishi
- Kyoto Inst. Tech.
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- Nishinaka Hiroyuki
- Kyoto Inst. Tech.
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- Yoshimoto Masahiro
- Kyoto Inst. Tech.
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- Noda Minoru
- Kyoto Inst. Tech.
Bibliographic Information
- Other Title
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- ミストCVD法Hf<sub>x</sub>Zr<sub>1-x</sub>O<sub>2</sub>薄膜特性の製膜後RTA依存性
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2021.1 (0), 1170-1170, 2021-02-26
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390855422502500992
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC