Comparison of Transport Characteristics of Nanodot Arrays Formed on Two Different SiO<sub>2</sub> Underlayers
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- Tanizawa Ryota
- Hokkaido Univ.
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- Amano Ikuma
- Hokkaido Univ.
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- Gyakushi Takayuki
- Hokkaido Univ.
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- Tsurumaki-Fukuchi Atsushi
- Hokkaido Univ.
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- Arita Masashi
- Hokkaido Univ.
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- Takahashi Yasuo
- Hokkaido Univ.
Bibliographic Information
- Other Title
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- 異なるSiO<sub>2</sub>下地層上に形成したナノドットアレイの電気特性比較
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2021.1 (0), 1617-1617, 2021-02-26
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390855422518789248
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC