Dependence of magnetic properties in superparamagnetic Co-granular thin films on deposition rate and effectiveness of a new pulsed DC reactive sputtering method for film fabrication with high deposition rate.

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  • KOBAYASHI Takumi
    Department of Materials Science, Materials Science and Engineering Course, Graduate school of Engineering and Science, Akita University,
  • NAKADA Akito
    Department of Materials Science, Materials Science and Engineering Course, Graduate school of Engineering and Science, Akita University,
  • EGAWA Genta
    Research Center of Advanced Materials for Breakthrough Technology, Graduate school of Engineering and Science, Akita University,
  • YOSHIMURA Satoru
    Research Center of Advanced Materials for Breakthrough Technology, Graduate school of Engineering and Science, Akita University,

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Other Title
  • 超常磁性Co基グラニュラー薄膜の磁気特性の成膜速度依存性と新規反応性パルスDCスパッタリング成膜法の有用性の検討

Abstract

<p>The superparamagnetic thin films with a granular structure show a characteristic magnetization curve. In this study, Co-Al2O3 granular thin films were fabricated by the sputtering method with normal DC source for Co deposition, RF source for Al2O3 deposition, and pulsed DC reactive sputtering were used for fabrication of non-magnetic matrix of oxide or nitride of Al or Si. As a result, Co-Al2O3 superparamagnetic thin films with high magnetization could be obtained with high deposition rate. Very high deposition rate was obtained for fabrication of oxide or nitride films of Al or Si using the pulsed DC reactive sputtering method. This deposition rate was 5 times larger than RF sputtering method. It is expected that a sputtering method with DC source for Co deposition and pulsed DC source for matrix deposition will be effective to realize very high magnetization in the superparamagnetic granular thin films.</p>

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