Thermal annealing effect on paramagnetic defects in silicon nitride films (Ⅲ)
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- Suzuki Aran
- Tokai Univ.
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- Nagashima Daiki
- Tokai Univ.
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- Hayashi Hiroki
- Tokai Univ.
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- Kobayashi Kiyoteru
- Tokai Univ. Tokai Univ.
Bibliographic Information
- Other Title
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- シリコン窒化膜の常磁性欠陥に対する熱処理の効果(Ⅲ)
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2014.2 (0), 2676-2676, 2014-09-01
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390859370678759936
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC