Charge compensation analysis of Li-rich layered oxide positive electrode using X-ray absorption fine structure measurement in the soft X-ray region
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- YAMANAKA Keisuke
- The SR Center, Ritsumeikan University
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- OISHI Masatsugu
- Office of Society-Academia Collaboration for Innovation, Kyoto University
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- NAKANISHI Koji
- The SR Center, Ritsumeikan University Office of Society-Academia Collaboration for Innovation, Kyoto University
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- WATANABE Iwao
- The SR Center, Ritsumeikan University Office of Society-Academia Collaboration for Innovation, Kyoto University
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- OHTA Toshiaki
- The SR Center, Ritsumeikan University
Bibliographic Information
- Other Title
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- 軟X線XAFSによるリチウム過剰層状酸化物正極の電荷補償機構解析
- ナンXセン XAFS ニ ヨル リチウム カジョウ ソウジョウ サンカブツ セイキョク ノ デンカ ホショウ キコウ カイセキ
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Description
<p>O K-edge and Mn L2,3-edge XAFS spectra of charged/discharged Li2MnO3 positive electrodes were observed to reveal the charge compensation mechanism of Li-rich layered oxides as LIB positive electrode materials. In the charge/discharge measurements, the profile at the first charge process was quite different from that after the first discharge. This result suggests that only the electrochemical reaction at the first charge process is different from any other process. O K-edge and Mn L2,3-edge XAFS spectra at each charge/discharge depth show specific changes, such as changes of pre-edge intensities and/or valence numbers corresponds to each charge/discharge reaction on the Li2MnO3 positive electrode. These XAFS results suggest that the charge compensations are achieved by oxygen desorption from the Li2MnO3 active material in the first charge process, and by the redox reactions of Mn at the lower voltage and O at the higher voltage after the first dischage.</p>
Journal
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- Advances in X-Ray Chemical Analysis, Japan
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Advances in X-Ray Chemical Analysis, Japan 47 (0), 321-331, 2016-03-31
The Discussion Group of X-Ray Analysis, The Japan Society for Analytical Chemistry
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Details 詳細情報について
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- CRID
- 1390860222062203264
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- NII Article ID
- 40020814240
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- NII Book ID
- AN0000592X
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- ISSN
- 27583651
- 09117806
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- NDL BIB ID
- 027278170
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL Search
- CiNii Articles
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- Abstract License Flag
- Allowed