Effect of Nitrogen Ratio on Structural, Electrical and Cell Adhesion Properties of TiZrN Thin Films Deposited at Room Temperature by Magnetron Sputtering

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  • Nguyen Dang Tuyen
    School of Materials Science and Engineering, Hanoi University of Science and Technology
  • Phuong Pham Thi Mai
    School of Materials Science and Engineering, Hanoi University of Science and Technology
  • Pham Sy Hieu
    Institute of Materials Science, Vietnam Academy of Science and Technology
  • Nguyen Van Chuc
    Institute of Materials Science, Vietnam Academy of Science and Technology
  • Tran Van Dang
    School of Materials Science and Engineering, Hanoi University of Science and Technology
  • Pham Anh Tuan
    Faculty of Power System, Electric Power University
  • Van Huan Pham
    School of Materials Science and Engineering, Hanoi University of Science and Technology
  • Nguyen Thi Thu Hien
    Faculty of Power System, Electric Power University
  • Van Hao Pham
    School of Materials Science and Engineering, Hanoi University of Science and Technology Hanoi Pedagogical University 2
  • Pham Vuong-Hung
    School of Materials Science and Engineering, Hanoi University of Science and Technology Laboratory of Biomedical Materials, Hanoi University of Science and Technology (HUST)
  • Nguyen Duy Cuong
    School of Materials Science and Engineering, Hanoi University of Science and Technology

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<p>In this paper, we report the structural and electrical properties of TiZrN thin films deposited by dc-magnetron sputtering under a working pressure of 0.67 Pa at room temperature. The phase structure, crystallinity, morphology, electrical properties, and hydrophilicity of TiZrN films were found to be strongly dependent on the nitrogen gas ratio of N2/(Ar+N2). In vitro Baby hamster kidney (BHK) cell adhesion on the TiZrN films was also tested for primary biocompatibility evaluation. The sputtered films exhibit a single-phase structure of (Ti, Zr)Nx without the presence of secondary phases such as TiNx or ZrNx. The lowest surface resistivity and resistivity values are observed in the films deposited at a 10% nitrogen ratio, with values of 12 Ω/□ and 1.79 × 10−5 Ω.m, respectively. TiZrN films deposited at different nitrogen ratios between 3–30% show hydrophilic properties, with contact angles ranging from 60 to 83 degrees. In vitro BHK cell test indicated that TiZrN films possess excellent biocompatibility. With the interesting performances indicated, TiZrN films have great potential for electrode applications and biomedical implants.</p>

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  • MATERIALS TRANSACTIONS

    MATERIALS TRANSACTIONS 65 (3), 339-345, 2024-03-01

    公益社団法人 日本金属学会

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