Photocatalytic Activity of WO₃ Films Crystallized by Postannealing in Air

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公開日
2012-05
DOI
  • 10.1143/jjap.51.055501
公開者
Tokyo : The Japan Society of Applied Physics

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説明

<jats:p> We devised an effective method of deposition of photocatalytic WO<jats:sub>3</jats:sub> films for the decomposition of volatile organic compounds. Amorphous WO<jats:sub>3</jats:sub> films were deposited on unheated fused silica glass substrates by reactive DC magnetron sputtering with a W metal target, followed by crystallization through annealing at 300–800 °C in air. Under visible light irradiation, a film annealed at 400 °C proved significantly more effective than a WO<jats:sub>3</jats:sub> film crystallized during deposition on a heated (800 °C) substrate for achieving photocatalytic decomposition of CH<jats:sub>3</jats:sub>CHO. Even more remarkable photocatalytic results were obtained for a film that was loaded with Pt nanoparticles after postannealing. </jats:p>

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