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Luminescence mechanism of SiOx films grown by atmospheric-pressure halide chemical vapor deposition
Bibliographic Information
- Other Title
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- Luminescence mechanism of SiOx films grown by atmospheric pressure halide chemical vapor deposition
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Description
資料形態 : テキストデータ プレーンテキスト
コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌
Journal
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- Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
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Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 46 (11), 7542-7544, 2007-11
Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1520009408020024320
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- NII Article ID
- 40015705155
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- NII Book ID
- AA10457675
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- ISSN
- 00214922
- 13474065
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- NDL BIB ID
- 9262305
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- Text Lang
- en
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- NDL Source Classification
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- ZM35(科学技術--物理学)
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- Data Source
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- NDL Search
- Crossref
- CiNii Articles
